Technology Transfer

Fluorine-Nitrogen mixture

M.W.	18.9984
Formula	F2-N2

Specification:

Name	Quality Index
F2%(V/V)	≥ 20
N2%(V/V)	≤ 80
CF4%(V/V)	≤ 0.05
O2%(V/V)	≤ 0.45

Applications:

Used in fields such as electronics, laser technology, pharmaceutical plastics etc. Due to its strong oxidizing properties, it can be used for glass etching, surface passivation treatment of metal materials and pipelines. It is used in the production of rocket propellants in national defense. High purity fluorine gas is also used in fields such as electronics, medicine, health, and scientific research.